目錄:筱曉（上海）光子技術(shù)有限公司>>光學(xué)無源器件>>光柵微透鏡陣列色散勻化片>> SNS-C20-0808-350-D60-P線性硅納米印章(納米圖案硅片)（ 光柵/微透鏡陣列/光色散/勻化片）
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線性硅納米印章(納米圖案硅片)（ 光柵/微透鏡陣列/光色散/勻化片）
LightSmyth提供了大量的納米加工單晶硅襯底，為工業(yè)和學(xué)術(shù)機(jī)構(gòu)提供了一個(gè)低成本的納米光子學(xué)研究入口?；卓捎糜诠鈱W(xué)、光子學(xué)、生物學(xué)、化學(xué)、物理學(xué)（如中子散射）、聚合物研究、納米印跡、微流體學(xué)等領(lǐng)域。如果需要，基板可以涂上金屬或介質(zhì)涂層。大多數(shù)地表特征具有略微梯形的橫截面輪廓，具有直線平行的臺(tái)地和溝渠。晶格狀結(jié)構(gòu)也可用。提供了許多特征尺寸和溝槽深度?；宓膾呙桦婄R圖像可以在裝運(yùn)前拍攝，以驗(yàn)證準(zhǔn)確的輪廓。
Nanopatterned Silicon Stamps
II-VI offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.
Dimensions shown in the table represent target value. Period has accuracy better than 0.5% while groove depth and the width of line and space may differ from the target values by 15%. SEM are given for illustration purposes. If more precise dimensional information is required, we may provide an SEM of the specific piece of nanostamp you order as an optional service
線性硅納米印章(納米圖案硅片)（ 光柵/微透鏡陣列/光色散/勻化片）
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